• Overview of Chinese core journals
  • Chinese Science Citation Database(CSCD)
  • Chinese Scientific and Technological Paper and Citation Database (CSTPCD)
  • China National Knowledge Infrastructure(CNKI)
  • Chinese Science Abstracts Database(CSAD)
  • JST China
  • SCOPUS
Ultraluminous X-ray sources and intermediate-mass black holes[J]. PHYSICS, 2009, 38(12): 860-860.
Citation: Ultraluminous X-ray sources and intermediate-mass black holes[J]. PHYSICS, 2009, 38(12): 860-860.

Ultraluminous X-ray sources and intermediate-mass black holes

More Information
  • Published Date: December 19, 2009
  • Ultraluminous X-ray sources (ULXs) are a special class of celestial objects found in nearby galaxies with X-ray emission. They behave like the black hole binaries in our Milky Way but have a higher X-ray luminosity, indicating that they may harbor more massive black holes which are the so called intermediate-mass black holes (IMBHs). IMBHs are interesting in astrophysics because they cannot be formed in the core collapse of a massive star at the end point of its evolution, which is speculated to be the mechanism how a stellar-mass black hole is formed. This article describes basic characteristics of ULXs, reviews important multiwavelength observations made in recent years of these sources, and discusses how the observations would place constraints on the nature of ULXs.
  • Related Articles

    [1]YANG Min, MA Guan-Cong, YANG Zhi-Yu, SHEN Ping. Low frequency acoustic sinks[J]. PHYSICS, 2016, 45(8): 520-527. DOI: 10.7693/wl20160806
    [2]JIANG Wei-Ping, WANG Qi, ZHOU Xin. Nuclear magnetic resonance spectroscopy and imaging[J]. PHYSICS, 2013, 42(12): 826-837. DOI: 10.7693/wl20131201
    [3]Controlled synthesis and tunable properties of noble-metal hybrid nanostructures with gold nanorods as cores[J]. PHYSICS, 2011, 40(09): 601-607.
    [4]Nuclear magnetic resonance applications in biological systems[J]. PHYSICS, 2011, 40(06): 366-373.
    [5]The physics of broad absorption line quasars[J]. PHYSICS, 2008, 37(08): 579-583.
    [6]Plasma light sources for extreme UV lithography and their optical properties[J]. PHYSICS, 2007, 36(07): 537-542.
    [7]Application of magnetic resonance imaging and spectroscopy in studying the biological effects of manufactured nanoparticles[J]. PHYSICS, 2006, 35(04): 294-298.
    [8]New applications of surface plasmon resonance technology[J]. PHYSICS, 2005, 34(12): 909-914.
    [9]Application of optical absorption transition effects and the development of semiconductor photo-electronic detectors[J]. PHYSICS, 2005, 34(11): 840-847.
    [10]TWO-PHOTON ABSORPTION PROPERTIES AND APPLICATIONS OF ORGANIC MATERIALS[J]. PHYSICS, 2003, 32(01).

Catalog

    Article views (80) PDF downloads (1802) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return