Application of nanofabrication to optoelectronics

PHYSICS > 2006 > 35(01): 51-55.

Application of nanofabrication to optoelectronics[J]. PHYSICS, 2006, 35(01): 51-55.

Citation:

Application of nanofabrication to optoelectronics[J]. PHYSICS, 2006, 35(01): 51-55.

Citation:

Application of nanofabrication to optoelectronics[J]. PHYSICS, 2006, 35(01): 51-55.

Abstract

Nano-scale circuits are becoming the core of optoelectronic devices of the next generation. Nanofabrication by means of electron beam lithography and inductively-coupled-plasma etching is reviewed，focussing mainly on the fabrication of quantum dot lasers, THz quantum dot detectors and photonic crystal devices.

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